The 786 is a low-phosphorus chemical nickel plating process with excellent stability. The plated layer is flexible and has a high melting point (1250℃), high hardness (640-700 HV100), and good electrical conductivity. It is suitable for high brazing requirements and general engineering applications. The deposition rate is 15-20μm/h, with a wide temperature range of 60-85℃ . It is widely used in carbon steel, stainless steel, copper alloys, titanium, aluminum alloys, and insulating materials such as plasticsand ceramics. The 786 process has good stability, and its operation and maintenance are simple. The 786 process is formulated with 786A and 786B for new tanks, and 786B and 786C are used as supplementary agents to maintain the plating solution. When long-term production is halted, the 786 adjusting agent is added to stabilize the plating solution.
